Paper Title:
A Novel Resist and Post-Etch Residue Removal Process Using Ozonated Chemistry
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 65-66)
Edited by
Marc Heyns, Marc Meuris and Paul Mertens
Pages
165-168
DOI
10.4028/www.scientific.net/SSP.65-66.165
Citation
S. De Gendt, P. Snee, I. Cornelissen, M. Lux, R. Vos, P. W. Mertens, D. M. Knotter, M.M. Meuris, M. M. Heyns, "A Novel Resist and Post-Etch Residue Removal Process Using Ozonated Chemistry", Solid State Phenomena, Vols. 65-66, pp. 165-168, 1999
Online since
November 1998
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Price
$32.00
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