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New Aspects of the Diluted Dynamic Clean Process

Journal Solid State Phenomena (Volumes 65 - 66)
Volume Ultra Clean Processing of Silicon Surfaces
Edited by Marc Heyns, Marc Meuris and Paul Mertens
Pages 19-22
DOI 10.4028/www.scientific.net/SSP.65-66.19
Authors F. Tardif, T. Lardin, A. Maciejny, Adrien Danel, Pieter Boelen, C. Cowache, Ismail Kashkoush, R. Novak
Keywords Cleaning, DDC, Gate Oxide, Roughness Impact, Silicon Consumption
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