New Aspects of the Diluted Dynamic Clean Process |
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| Journal | Solid State Phenomena (Volumes 65 - 66) |
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| Volume | Ultra Clean Processing of Silicon Surfaces |
| Edited by | Marc Heyns, Marc Meuris and Paul Mertens |
| Pages | 19-22 |
| DOI | 10.4028/www.scientific.net/SSP.65-66.19 |
| Authors | F. Tardif, T. Lardin, A. Maciejny, Adrien Danel, Pieter Boelen, C. Cowache, Ismail Kashkoush, R. Novak |
| Keywords | Cleaning, DDC, Gate Oxide, Roughness Impact, Silicon Consumption |
| Full Paper | 
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