New Aspects of the Diluted Dynamic Clean Process |
| Journal |
Solid State Phenomena (Volumes 65 - 66) |
| Volume |
Ultra Clean Processing of Silicon Surfaces IV |
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
19-22 |
| DOI |
10.4028/www.scientific.net/SSP.65-66.19 |
| Citation |
F. Tardif et al., 1998, Solid State Phenomena, 65-66, 19 |
| Authors |
F. Tardif, T. Lardin, A. Maciejny, Adrien Danel, Pieter Boelen, C. Cowache, Ismail Kashkoush, R. Novak |
| Keywords |
Cleaning, DDC, Gate Oxide, Roughness Impact, Silicon Consumption |
| Full Paper |
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