Paper Title:
Integrated Cleaning: Application of Densified Fluid Cleaning (DFC) to Post-Etch Residue Removal
| Periodical |
Solid State Phenomena (Volumes 65 - 66)
|
| Main Theme |
Ultra Clean Processing of Silicon Surfaces IV
|
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
195-198 |
| DOI |
10.4028/www.scientific.net/SSP.65-66.195 |
| Citation |
V. Starov et al., 1998, Solid State Phenomena, 65-66, 195 |
| Authors |
V. Starov, D. Beery, Alex Kabansky |
| Keywords |
Post-Etch Residue Removal, Surface Preparation, Wafer Cleaning |
| Price |
US$ 28,- |