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Single Step Alkaline Cleaning Solution for Advanced Semiconductor Cleaning

Journal Solid State Phenomena (Volumes 65 - 66)
Volume Ultra Clean Processing of Silicon Surfaces
Edited by Marc Heyns, Marc Meuris and Paul Mertens
Pages 23-26
DOI 10.4028/www.scientific.net/SSP.65-66.23
Authors M. Baeyens, W. Hub, Bernd O. Kolbesen, A.R. Martin, Paul W. Mertens
Keywords Complexing Agent, Dilute SC-1, Gate Oxide Integrity, Metal Precipitation, RCA Modification, SC-1 Cleaning
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