Single Step Alkaline Cleaning Solution for Advanced Semiconductor Cleaning |
| Journal |
Solid State Phenomena (Volumes 65 - 66) |
| Volume |
Ultra Clean Processing of Silicon Surfaces IV |
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
23-26 |
| DOI |
10.4028/www.scientific.net/SSP.65-66.23 |
| Citation |
M. Baeyens et al., 1998, Solid State Phenomena, 65-66, 23 |
| Authors |
M. Baeyens, W. Hub, Bernd O. Kolbesen, A.R. Martin, Paul W. Mertens |
| Keywords |
Complexing Agent, Dilute SC-1, Gate Oxide Integrity, Metal Precipitation, RCA Modification, SC-1 Cleaning |
| Full Paper |
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