Role of UV/Chlorine Exposure during Dry Surface Conditioning before Integrated Epi Deposition Process |
| Journal |
Solid State Phenomena (Volumes 65 - 66) |
| Volume |
Ultra Clean Processing of Silicon Surfaces IV |
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
233-236 |
| DOI |
10.4028/www.scientific.net/SSP.65-66.233 |
| Citation |
J. Ruzyllo et al., 1998, Solid State Phenomena, 65-66, 233 |
| Authors |
J. Ruzyllo, Erika Röhr, Matty Caymax, M. Baeyens, Thierry Conard, Paul W. Mertens, Marc M. Heyns |
| Keywords |
Cluster Processing, Dry Cleaning, Low-Temperature Epitaxy, UV/Chlorine |
| Full Paper |
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