Paper Title:
X-Ray Photoelectron Study of Gate Oxides and Nitrides
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 65-66)
Edited by
Marc Heyns, Marc Meuris and Paul Mertens
Pages
257-260
DOI
10.4028/www.scientific.net/SSP.65-66.257
Citation
R.L. Opila, J. P. Chang, M. Du, J. Bevk, Y. Ma, M. Weldon, Y. Chabal, A.B. Gurevich, "X-Ray Photoelectron Study of Gate Oxides and Nitrides", Solid State Phenomena, Vols. 65-66, pp. 257-260, 1999
Online since
November 1998
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Price
$32.00
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