Particle Removal Efficiency and Silicon Roughness in HF-DIW/O3/Megasonics Cleaning |
|
| Journal | Solid State Phenomena (Volumes 65 - 66) |
|---|---|
| Volume | Ultra Clean Processing of Silicon Surfaces |
| Edited by | Marc Heyns, Marc Meuris and Paul Mertens |
| Pages | 27-30 |
| DOI | 10.4028/www.scientific.net/SSP.65-66.27 |
| Authors | Mauro Alessandri, Enrico Bellandi, Francesco Pipia, F. Cazzaniga, K. Wolke, M. Schenkl |
| Keywords | HF, Ozone, Removal Efficiency |
| Full Paper | 
Get the full paper by clicking here
|