Particle Removal Efficiency and Silicon Roughness in HF-DIW/O3/Megasonics Cleaning |
| Journal |
Solid State Phenomena (Volumes 65 - 66) |
| Volume |
Ultra Clean Processing of Silicon Surfaces IV |
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
27-30 |
| DOI |
10.4028/www.scientific.net/SSP.65-66.27 |
| Citation |
Mauro Alessandri et al., 1998, Solid State Phenomena, 65-66, 27 |
| Authors |
Mauro Alessandri, Enrico Bellandi, Francesco Pipia, F. Cazzaniga, K. Wolke, M. Schenkl |
| Keywords |
HF, Ozone, Removal Efficiency |
| Full Paper |
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