Influence of the Dissolved Gas in Cleaning Solution on Silicon Wafer Cleaning Efficiency |
| Journal |
Solid State Phenomena (Volumes 65 - 66) |
| Volume |
Ultra Clean Processing of Silicon Surfaces IV |
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
43-48 |
| DOI |
10.4028/www.scientific.net/SSP.65-66.43 |
| Citation |
H. Kanetaka et al., 1998, Solid State Phenomena, 65-66, 43 |
| Authors |
H. Kanetaka, Toshihiko Kujime, H. Yazaki, T. Kezuka, Tadahiro Ohmi |
| Keywords |
Dissolved Gas, Surfactant, Wet Cleaning |
| Full Paper |
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