Optimization of Deionized Water Consumption in Wafer Wet Processing |
| Journal |
Solid State Phenomena (Volumes 65 - 66) |
| Volume |
Ultra Clean Processing of Silicon Surfaces IV |
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
49-52 |
| DOI |
10.4028/www.scientific.net/SSP.65-66.49 |
| Citation |
Ismail Kashkoush et al., 1998, Solid State Phenomena, 65-66, 49 |
| Authors |
Ismail Kashkoush, R. Novak |
| Keywords |
Chemical Concentration, De-Ionized Water, Impurities, Particle, Recycling, Rinse Cycle, Surface Contamination, Wet Cleaning |
| Full Paper |
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