Potassium Adhesion to Various CVD Oxide and the Surface Cleaning with Hot UPW |
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| Journal | Solid State Phenomena (Volumes 65 - 66) |
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| Volume | Ultra Clean Processing of Silicon Surfaces IV |
| Edited by | Marc Heyns, Marc Meuris and Paul Mertens |
| Pages | 67-70 |
| DOI | 10.4028/www.scientific.net/SSP.65-66.67 |
| Citation | T. Jizaimaru et al., 1998, Solid State Phenomena, 65-66, 67 |
| Authors | T. Jizaimaru, H. Kanetaka, S. Omae, Tadahiro Ohmi |
| Keywords | Annealing, K (Potassium), SiO2 |
| Full Paper | 
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