Post Dry-Etch Cleaning Issues of an Organic Low-K Dielectric |
| Journal |
Solid State Phenomena (Volumes 65 - 66) |
| Volume |
Ultra Clean Processing of Silicon Surfaces IV |
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
89-92 |
| DOI |
10.4028/www.scientific.net/SSP.65-66.89 |
| Citation |
F. Lanckmans et al., 1998, Solid State Phenomena, 65-66, 89 |
| Authors |
F. Lanckmans, Mikhail R. Baklanov, C. Alaerts, Serge Vanhaelemeersch, Karen Maex |
| Keywords |
Organic Dielectric, Residue, Wet Strip |
| Full Paper |
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