Characterization of the Post Dry Etch Cleaning of the Silicon Surface Prior to Silicon Epitaxial Growth |
| Journal |
Solid State Phenomena (Volumes 65 - 66) |
| Volume |
Ultra Clean Processing of Silicon Surfaces IV |
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
97-100 |
| DOI |
10.4028/www.scientific.net/SSP.65-66.97 |
| Citation |
Y.B. Kim et al., 1998, Solid State Phenomena, 65-66, 97 |
| Authors |
Y.B. Kim, Matty Caymax, H. Bender, Serge Vanhaelemeersch |
| Keywords |
Epitaxial Growth, Hydrogen Anneal, MIR-IR, Plasma Etching, Post Cleaning, SIMS, X-Ray Photoelectron Spectroscopy (XPS) |
| Full Paper |
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