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Ultra Clean Processing of Silicon Surfaces IV

Solid State Phenomena Volumes 65 - 66

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• p187 Evaluation of a Dry Laser Cleaning Process for the Removal of Surface Particles   [ 249 K ]
  Authors: Guy Vereecke, Erika Röhr, Marc M. Heyns
• p191 Dependency of Micro Particle Adhesion of Dispersive and Nondispersive Interactions Analyzed by Atomic Force Microscopy   [ 200 K ]
  Authors: A. Kawai, Kunio Shimada, E. Andoh
• p195 Integrated Cleaning: Application of Densified Fluid Cleaning (DFC) to Post-Etch Residue Removal   [ 306 K ]
  Authors: V. Starov, D. Beery, Alex Kabansky
• p199 Application of Microcalorimeter EDS X-Ray Detectors to Particle Analysis   [ 200 K ]
  Authors: Alain C. Diebold, D.A. Wollman, G.C. Hilton, K.D. Irwin, J.M. Martinis, Benjamin Y.H. Liu
• p203 Surface Characterization in the Silicon Cleaning Process by a-UPC; Atmospheric Ultraviolet Photoelectron Counting   [ 162 K ]
  Authors: Y. Kôzuki, Y. Nakajima, T. Sato, Kei Kinoshita, T. Tsunoda
• p207 Microscopic Analysis of Particle Removal by Gas/Liquid Mixture High-Speed Flow   [ 152 K ]
  Authors: N. Hirano, K. Takayama, J. Falcovitz, T. Kataoka, Kunio Shimada, E. Ando
• p211 Kelvin-SPV Measurements of Atomically-Flat Si(111) Surfaces Contaminated with Metallic Ions   [ 169 K ]
  Authors: T. Tagawa, Tsugunori Okumura
• p215 Comparison of Analytical Methods for Residue Detection of Resist Removal Processes   [ 228 K ]
  Authors: T. Riihisaari, J. Likonen, Arto Kiviranta, S. Eränen, S. Lehto, J. Tuominen, T. Lindblom, E. Muukkonen
• p219 Dry Cleaning Technologies Using UV-Excited Radicals and Cryogenic Aerosols   [ 297 K ]
  Authors: Tadashi Ito, R. Sugino
• p225 A New HF Vapor Process for Native Oxide Removal, Suited for Cluster Applications   [ 251 K ]
  Authors: A.B. Storm, H. Sprey, J.W. Maes, E. Granneman, R. de Blank, Erika Röhr, Matty Caymax, Marc M. Heyns
• p229 Silicon Surface Cleaning for Low Temperature Silicon Epitaxial Growth   [ 185 K ]
  Authors: Masao Mayuzumi, M. Imai, S. Nakahara, Katsuya Inoue, J. Takahashi, Tadahiro Ohmi
• p233 Role of UV/Chlorine Exposure during Dry Surface Conditioning before Integrated Epi Deposition Process   [ 206 K ]
  Authors: J. Ruzyllo, Erika Röhr, Matty Caymax, M. Baeyens, Thierry Conard, Paul W. Mertens, Marc M. Heyns
• p237 Electrical Evaluation of the Epi/Substrate Interface Quality after Different In-Situ and Ex-Situ Low-Temperature Pre-Epi Cleaning Methods   [ 304 K ]
  Authors: Matty Caymax, S. Decoutere, Erika Röhr, W. Vandervorst, Marc M. Heyns, H. Sprey, A.B. Storm, J.W. Maes
• p241 Energy Loss of O1s Photoelectrons in Compositional and Structural Transition Layer at and near the SiO₂/Si Interface   [ 240 K ]
  Authors: H. Nohira, Kunimasa Takahashi, Takeshi Hattori
• p245 Metal Enhanced Oxidation of Silicon   [ 177 K ]
  Authors: M. Börner, N. Junghans, S. Landau, Bernd O. Kolbesen