Paper Title:
Thin Films Hydrogenated Silicon Deposited by Direct Current Magnetron Sputtering at High Rate
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 67-68)
Edited by
J.H. Werner, H.P. Strunk, H.W. Schock
Pages
113-118
DOI
10.4028/www.scientific.net/SSP.67-68.113
Citation
R. Cherfi, G. Farhi, M. Aoucher, "Thin Films Hydrogenated Silicon Deposited by Direct Current Magnetron Sputtering at High Rate", Solid State Phenomena, Vols. 67-68, pp. 113-118, 1999
Online since
April 1999
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.