Paper Title:
Polycrystalline Silicon Films Produced by Low Pressure Chemical Vapour Deposition for Microswitch Applications: The Stress as Dependent on Deposition Conditions, Doping Type, and Thermal Treatments
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 67-68)
Edited by
J.H. Werner, H.P. Strunk, H.W. Schock
Pages
223-228
DOI
10.4028/www.scientific.net/SSP.67-68.223
Citation
S. Lucas, K. Kis-Sion, J. Penven, O. Bonnaud, J. Pinel, "Polycrystalline Silicon Films Produced by Low Pressure Chemical Vapour Deposition for Microswitch Applications: The Stress as Dependent on Deposition Conditions, Doping Type, and Thermal Treatments", Solid State Phenomena, Vols. 67-68, pp. 223-228, 1999
Online since
April 1999
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Price
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