Paper Title:
Ion Assisted Reactive Magnetron Sputtering as a Deposition Method for High Quality Thin Films of Compound Semiconductors
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 67-68)
Edited by
J.H. Werner, H.P. Strunk, H.W. Schock
Pages
261-268
DOI
10.4028/www.scientific.net/SSP.67-68.261
Citation
K. Ellmer, "Ion Assisted Reactive Magnetron Sputtering as a Deposition Method for High Quality Thin Films of Compound Semiconductors", Solid State Phenomena, Vols. 67-68, pp. 261-268, 1999
Online since
April 1999
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Price
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