Process to Fabricate High Performance Solid Phase Crystallized n-Type and p-Type Thin Film Transistors on Glass Substrate |
| Journal |
Solid State Phenomena (Volumes 67 - 68) |
| Volume |
Polycrystalline Semiconductors V |
| Edited by |
J.H. Werner, H.P. Strunk, H.W. Schock |
| Pages |
547-552 |
| DOI |
10.4028/www.scientific.net/SSP.67-68.547 |
| Citation |
K. Mourgues et al., 1999, Solid State Phenomena, 67-68, 547 |
| Authors |
K. Mourgues, F. Raoult, Youri Helen, T. Mohammed-Brahim, R. Rogel, O. Bonnaud |
| Keywords |
Glass Substrate, In Situ Doping, Solid Phase Crystallization, Thin Film Transistor |
| Full Paper |
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