Paper Title:
The Influence of Low-Energy Argon Implantation and Out-Diffusion Heat Treatments on Hydrogen Enhanced Thermal Donor Formation in P-Type Czochralski Silicon
  Abstract

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Periodical
Solid State Phenomena (Volumes 69-70)
Edited by
H.G. Grimmeiss, L. Ask, M. Kleverman, M. Kittler and H. Richter
Pages
409-416
DOI
10.4028/www.scientific.net/SSP.69-70.409
Citation
A. G. Ulyashin, A.N. Petlitskii, R. Job, W. R. Fahrner, A.K. Fedotov, A.I. Stognii, "The Influence of Low-Energy Argon Implantation and Out-Diffusion Heat Treatments on Hydrogen Enhanced Thermal Donor Formation in P-Type Czochralski Silicon", Solid State Phenomena, Vols. 69-70, pp. 409-416, 1999
Online since
August 1999
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Price
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