Paper Title:
Correlation between Intrinsic Stress Distribution and Crystallographic Defects Density Profile in Czochralski Silicon after CMOS Processing
  Abstract

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Periodical
Solid State Phenomena (Volumes 69-70)
Edited by
H.G. Grimmeiss, L. Ask, M. Kleverman, M. Kittler and H. Richter
Pages
519-524
DOI
10.4028/www.scientific.net/SSP.69-70.519
Citation
T. Piotrowski, W. Jung, "Correlation between Intrinsic Stress Distribution and Crystallographic Defects Density Profile in Czochralski Silicon after CMOS Processing", Solid State Phenomena, Vols. 69-70, pp. 519-524, 1999
Online since
August 1999
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Price
$32.00
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