Paper Title:
Substrate Material for sub-0.25µm Si Technology Comparison of Hydrogen Annealed Wafers and Challengers: Evidence for Dopant Enhanced Diffusion
  Abstract

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Periodical
Solid State Phenomena (Volumes 69-70)
Edited by
H.G. Grimmeiss, L. Ask, M. Kleverman, M. Kittler and H. Richter
Pages
577-582
DOI
10.4028/www.scientific.net/SSP.69-70.577
Citation
M.T. Bostelmann, B. Leroy, "Substrate Material for sub-0.25µm Si Technology Comparison of Hydrogen Annealed Wafers and Challengers: Evidence for Dopant Enhanced Diffusion", Solid State Phenomena, Vols. 69-70, pp. 577-582, 1999
Online since
August 1999
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