Paper Title:
Oxygen Precipitation Behaviour and Internal Gettering in Epitaxial and Polished Czochralski Silicon Wafers
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 69-70)
Edited by
H.G. Grimmeiss, L. Ask, M. Kleverman, M. Kittler and H. Richter
Pages
63-72
DOI
10.4028/www.scientific.net/SSP.69-70.63
Citation
K. Sueoka, M. Akatsuka, M. Yonemura, S. Sadamitsu, E. Asayama, T. Ono, Y. Koike, H. Katahama, "Oxygen Precipitation Behaviour and Internal Gettering in Epitaxial and Polished Czochralski Silicon Wafers", Solid State Phenomena, Vols. 69-70, pp. 63-72, 1999
Online since
August 1999
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Price
$32.00
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