Role of Oxygen in Metal Silicide Formation and Properties |
|
| Journal | Solid State Phenomena (Volume 71) |
|---|---|
| Volume | Special Defects in Semiconducting Materials |
| Edited by | R.P. Agarwala |
| Pages | 119-146 |
| DOI | 10.4028/www.scientific.net/SSP.71.119 |
| Citation | S.P. Murarka, 1999, Solid State Phenomena, 71, 119 |
| Authors | S.P. Murarka |
| Keywords | Impurities, Interface, Metals, Oxygen, Reaction Kinetics, Silicide |
| Full Paper | 
Get the full paper by clicking here
|
First page example
