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Ultra Clean Processing of Silicon Surfaces

Solid State Phenomena Volumes 76 - 77

• Papers
• Abstracts

• p1 Defects and Contamination in Microelectronic Device Production: State-of-the-Art and Prospects   [ 447 K ]
  Authors: Bernd O. Kolbesen, Hans Cerva, G. Zoth
• p7 The Effect of Ion Implantation on the Metal Contamination of Silicon Surfaces in Aqueous Solution   [ 84 K ]
  Authors: Lee M. Loewenstein, Paul W. Mertens, Marc M. Heyns
• p9 Barium, Strontium and Bismuth Contamination in CMOS Processes   [ 370 K ]
  Authors: H. Boubekeur, T. Mikolajick, J. Höpfner, C. Dehm, W. Pamler, J. Steiner, G. Kilian, Bernd O. Kolbesen, Anton J. Bauer, Lothar Frey, Heiner Ryssel
• p15 An Exploration on the Bridge Formation Mechanism of Cylindrical Storage Poly-Silicon by Water Marks in High Performance 4Gigabit DRAM Capacitor   [ 234 K ]
  Authors: Kun Tack Lee, Woo Gwan Shim, Hyung Ho Ko, Ho Young Kim, Yong Pil Han, Sang Rok Hah, Joo Tae Moon
• p19 Chemical Processing and Materials Compatibility of High-K Dielectric Materials for Advanced Gate Stacks   [ 223 K ]
  Authors: J.J. Guan, Glenn W. Gale, G. Bersuker, M. Jackson, Howard R. Huff
• p23 Wettability Modification of Polysilicon for Stiction Reduction in Silicon Based Micro-electromechanical Structures   [ 205 K ]
  Authors: Angeles Marcia Almanza-Workman, Srini Raghavan, Pierre Deymier, David J. Monk, Ray Roop
• p27 Dual Gate Oxide for 0.18μm Technologies and Below: Optimization of the Wet Processing Sequence   [ 212 K ]
  Authors: Didier Lévy, Sébastien Petitdidier, H. Bernard, F. Guyader, C. Dezauzier, C. Pizzetti
• p31 New Aqueous Clean for Aluminum Interconnects: Part I. Fundamentals   [ 229 K ]
  Authors: D.L. Rath, R. Ravikumar, D.J. Delehanty, R.G. Filippi, E.W. Kiewra, G. Stojakovic, K.J. McCullough, D.D. Miura, B.N. Rhoads
• p35 Metal Wet Cleaning with No Corrosion: A Novel Approach   [ 217 K ]
  Authors: Francesco Pipia, Geun Min Choi, Tadahiro Ohmi
• p39 Non-Contact Post Cu CMP Cleaning Using Megasonic Energy   [ 273 K ]
  Authors: Wim Fyen, Jeffrey M. Lauerhaas, Ingrid Vos, Marc Meuris, Paul W. Mertens, Marc M. Heyns
• p43 Improved Phosphoric Acid Mixtures for Nitride Strip   [ 222 K ]
  Authors: Rita Vos, Marcel Lux, Thierry Conard, H. De Witte, Paul W. Mertens, Marc M. Heyns, Z. Hatcher
• p47 Silicon Wafer Cleaning Processes Monitoring by the Surface Charge Profiler Method   [ 204 K ]
  Authors: Adrien Danel, Pascal Besson, T. Lardin, F. Tardif
• p51 New Aqueous Clean for Aluminum Interconnects: Part II. Applications   [ 201 K ]
  Authors: R. Ravikumar, D.L. Rath, D.J. Delehanty, R.G. Filippi, E.W. Kiewra, G. Stojakovic, K.J. McCullough, D.D. Miura, J. Gambino, F. Schnabel, B.N. Rhoads
• p55 Synchronous Schlieren Image Analysis of Megasonic Single Wafer Cleaning   [ 188 K ]
  Authors: Takashi Azuma, Akihiro Tomozawa, Hideo Kinoshita, Shin-ichiro Umemura
• p59 Dry Cleaning of Organic Contamination on Silicon Wafers Using Rapid Optical Surface Treatment   [ 226 K ]
  Authors: Adrien Danel, Névine Rochat, M. Olivier, A. Roche, F. Tardif