Ultra Clean Processing of Silicon Surfaces V
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Preface, Conference Organisation and Sponsors
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Defects and Contamination in Microelectronic Device Production: State-of-the-Art and Prospects Authors: Bernd O. Kolbesen, Hans Cerva, G. Zoth |
1 |
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The Effect of Ion Implantation on the Metal Contamination of Silicon Surfaces in Aqueous Solution Authors: Lee M. Loewenstein, Paul W. Mertens, Marc M. Heyns |
7 |
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Barium, Strontium and Bismuth Contamination in CMOS Processes Authors: H. Boubekeur, T. Mikolajick, J. Höpfner, C. Dehm, W. Pamler, J. Steiner, G. Kilian, Bernd O. Kolbesen, Anton J. Bauer, Lothar Frey, Heiner Ryssel |
9 |
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Authors: Kun Tack Lee, Woo Gwan Shim, Hyung Ho Ko, Ho Young Kim, Yong Pil Han, Sang Rok Hah, Joo Tae Moon |
15 |
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Authors: J.J. Guan, Glenn W. Gale, G. Bersuker, M. Jackson, Howard R. Huff |
19 |
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Authors: Angeles Marcia Almanza-Workman, Srini Raghavan, Pierre Deymier, David J. Monk, Ray Roop |
23 |
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Dual Gate Oxide for 0.18μm Technologies and Below: Optimization of the Wet Processing Sequence Authors: Didier Lévy, Sébastien Petitdidier, H. Bernard, F. Guyader, C. Dezauzier, C. Pizzetti |
27 |
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New Aqueous Clean for Aluminum Interconnects: Part I. Fundamentals Authors: D.L. Rath, R. Ravikumar, D.J. Delehanty, R.G. Filippi, E.W. Kiewra, G. Stojakovic, K.J. McCullough, D.D. Miura, B.N. Rhoads |
31 |
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Metal Wet Cleaning with No Corrosion: A Novel Approach Authors: Francesco Pipia, Geun Min Choi, Tadahiro Ohmi |
35 |