Single Chemistry Cleaning Solution for Advanced Wafer Cleaning |
| Journal |
Solid State Phenomena (Volumes 76 - 77) |
| Volume |
Ultra Clean Processing of Silicon Surfaces V |
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
119-122 |
| DOI |
10.4028/www.scientific.net/SSP.76-77.119 |
| Citation |
Rita Vos et al., 2001, Solid State Phenomena, 76-77, 119 |
| Authors |
Rita Vos, O. Doll, A. Fester, Bernd O. Kolbesen, Marcel Lux, Karine Kenis, Bart Onsia, S. Degendt, E. Schellkes, Z. Hatcher, Paul W. Mertens, Marc M. Heyns |
| Keywords |
APM, Complexing Agent, Metal Contamination, Scintillation Counter |
| Full Paper |
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