Modification of Low-K SiCOH Film Porosity by a HF Solution |
| Journal |
Solid State Phenomena (Volumes 76 - 77) |
| Volume |
Ultra Clean Processing of Silicon Surfaces V |
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
135-138 |
| DOI |
10.4028/www.scientific.net/SSP.76-77.135 |
| Citation |
Denis Shamiryan et al., 2001, Solid State Phenomena, 76-77, 135 |
| Authors |
Denis Shamiryan, Mikhail R. Baklanov, Guy Vereecke, Serge Vanhaelemeersch, Karen Maex |
| Keywords |
Low-K Material, Porosity |
| Full Paper |
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