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Influence of Boron and Fluorine Incorporation on the Network Structure of Ultrathin SiO2

Journal Solid State Phenomena (Volumes 76 - 77)
Volume Ultra Clean Processing of Silicon Surfaces V
Edited by Marc Heyns, Marc Meuris and Paul Mertens
Pages 149-152
DOI 10.4028/www.scientific.net/SSP.76-77.149
Citation Seiichi Miyazaki et al., 2001, Solid State Phenomena, 76-77, 149
Authors Seiichi Miyazaki, Kazuhiro Morino, Masataka Hirose
Keywords Impurity Pileup, SiO2/SiC Interface, Structural Relaxation
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