The Origins of Fluorine in Dry Ultrathin Silicon Oxides |
| Journal |
Solid State Phenomena (Volumes 76 - 77) |
| Volume |
Ultra Clean Processing of Silicon Surfaces V |
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
153-156 |
| DOI |
10.4028/www.scientific.net/SSP.76-77.153 |
| Citation |
Guy Vereecke et al., 2001, Solid State Phenomena, 76-77, 153 |
| Authors |
Guy Vereecke, Erika Röhr, R.J. Carter, Thierry Conard, H. De Witte, Marc M. Heyns |
| Keywords |
Fluorine Contamination, Subsurface Fluorine, Ultrathin Silicon Oxides |
| Full Paper |
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