Characterization of DI Water/O3 Oxidation of Si (100) and Si (111) Surfaces by OCP Measurements |
|
| Journal | Solid State Phenomena (Volumes 76 - 77) |
|---|---|
| Volume | Ultra Clean Processing of Silicon Surfaces V |
| Edited by | Marc Heyns, Marc Meuris and Paul Mertens |
| Pages | 161-164 |
| DOI | 10.4028/www.scientific.net/SSP.76-77.161 |
| Citation | Harald Okorn-Schmidt et al., 2001, Solid State Phenomena, 76-77, 161 |
| Authors | Harald Okorn-Schmidt, C. D'Emic, R. Murphy |
| Keywords | OCP, Ozone, Roughness |
| Full Paper | 
Get the full paper by clicking here
|
First page example
