Controlling Silicon Surface Roughness During Photochemical Cleaning |
| Journal |
Solid State Phenomena (Volumes 76 - 77) |
| Volume |
Ultra Clean Processing of Silicon Surfaces V |
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
169-172 |
| DOI |
10.4028/www.scientific.net/SSP.76-77.169 |
| Citation |
Jeffery W. Butterbaugh et al., 2001, Solid State Phenomena, 76-77, 169 |
| Authors |
Jeffery W. Butterbaugh, Brent Schwab, Thomas Sorsch, Martin L. Green |
| Keywords |
Dry Cleaning, Silicon Roughness, UV/Chlorine |
| Full Paper |
Get the full paper by clicking here
|
