A Probe of Chemical Oxide Growth Conditions |
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| Journal | Solid State Phenomena (Volumes 76 - 77) |
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| Volume | Ultra Clean Processing of Silicon Surfaces V |
| Edited by | Marc Heyns, Marc Meuris and Paul Mertens |
| Pages | 185-188 |
| DOI | 10.4028/www.scientific.net/SSP.76-77.185 |
| Citation | Larry W. Shive et al., 2001, Solid State Phenomena, 76-77, 185 |
| Authors | Larry W. Shive, Claire Frey, Carissima Vitus |
| Keywords | Photo-Thermal Reflection Spectroscopy, Silicon Dioxide, Stress |
| Full Paper |
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