Paper Title:
Chemical Processing and Materials Compatibility of High-K Dielectric Materials for Advanced Gate Stacks
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 76-77)
Edited by
Marc Heyns, Marc Meuris and Paul Mertens
Pages
19-22
DOI
10.4028/www.scientific.net/SSP.76-77.19
Citation
J.J. Guan, G. W. Gale, G. Bersuker, M. Jackson, H. R. Huff, "Chemical Processing and Materials Compatibility of High-K Dielectric Materials for Advanced Gate Stacks", Solid State Phenomena, Vols. 76-77, pp. 19-22, 2001
Online since
January 2001
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Price
$32.00
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