Chemical Processing and Materials Compatibility of High-K Dielectric Materials for Advanced Gate Stacks |
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| Journal | Solid State Phenomena (Volumes 76 - 77) |
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| Volume | Ultra Clean Processing of Silicon Surfaces |
| Edited by | Marc Heyns, Marc Meuris and Paul Mertens |
| Pages | 19-22 |
| DOI | 10.4028/www.scientific.net/SSP.76-77.19 |
| Authors | J.J. Guan, Glenn W. Gale, G. Bersuker, M. Jackson, Howard R. Huff |
| Keywords | Chemical Processing, Gate Stack, High K Dielectrics, Metal-Oxide-Semiconductor Field Effect Transistor (MOSFET) |
| Full Paper | 
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