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Chemical Processing and Materials Compatibility of High-K Dielectric Materials for Advanced Gate Stacks

Journal Solid State Phenomena (Volumes 76 - 77)
Volume Ultra Clean Processing of Silicon Surfaces
Edited by Marc Heyns, Marc Meuris and Paul Mertens
Pages 19-22
DOI 10.4028/www.scientific.net/SSP.76-77.19
Authors J.J. Guan, Glenn W. Gale, G. Bersuker, M. Jackson, Howard R. Huff
Keywords Chemical Processing, Gate Stack, High K Dielectrics, Metal-Oxide-Semiconductor Field Effect Transistor (MOSFET)
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