Paper Title:

Chemical Processing and Materials Compatibility of High-K Dielectric Materials for Advanced Gate Stacks

Periodical Solid State Phenomena (Volumes 76 - 77)
Main Theme Ultra Clean Processing of Silicon Surfaces V
Edited by Marc Heyns, Marc Meuris and Paul Mertens
Pages 19-22
DOI 10.4028/www.scientific.net/SSP.76-77.19
Citation J.J. Guan et al., 2001, Solid State Phenomena, 76-77, 19
Authors J.J. Guan, Glenn W. Gale, G. Bersuker, M. Jackson, Howard R. Huff
Keywords Chemical Processing, Gate Stack, High-k Dielectrics, Metal-Oxide-Semiconductor Field Effect Transistor (MOSFET)
Price US$ 28,-
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