Paper Title:
Chemical Processing and Materials Compatibility of High-K Dielectric Materials for Advanced Gate Stacks
| Periodical |
Solid State Phenomena (Volumes 76 - 77)
|
| Main Theme |
Ultra Clean Processing of Silicon Surfaces V
|
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
19-22 |
| DOI |
10.4028/www.scientific.net/SSP.76-77.19 |
| Citation |
J.J. Guan et al., 2001, Solid State Phenomena, 76-77, 19 |
| Authors |
J.J. Guan, Glenn W. Gale, G. Bersuker, M. Jackson, Howard R. Huff |
| Keywords |
Chemical Processing, Gate Stack, High-k Dielectrics, Metal-Oxide-Semiconductor Field Effect Transistor (MOSFET) |
| Price |
US$ 28,- |