Paper Title:
New Method to Generate the High Concentration Ozonated Water by Using the Ultrapure Water of the Semiconductor Factory
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 76-77)
Edited by
Marc Heyns, Marc Meuris and Paul Mertens
Pages
219-222
DOI
10.4028/www.scientific.net/SSP.76-77.219
Citation
M. Miyamoto, I. Oya, S. Noda, M. Kuzumoto, "New Method to Generate the High Concentration Ozonated Water by Using the Ultrapure Water of the Semiconductor Factory", Solid State Phenomena, Vols. 76-77, pp. 219-222, 2001
Online since
January 2001
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