Paper Title:
Megasonic, Non-Contact Cleaning Followed by 'Rotagoni' Drying of CMP Wafers
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 76-77)
Edited by
Marc Heyns, Marc Meuris and Paul Mertens
Pages
251-254
DOI
10.4028/www.scientific.net/SSP.76-77.251
Citation
J. M. Lauerhaas, P. W. Mertens, T. Nicolosi, K. Kenis, W. Fyen, M. M. Heyns, "Megasonic, Non-Contact Cleaning Followed by 'Rotagoni' Drying of CMP Wafers", Solid State Phenomena, Vols. 76-77, pp. 251-254, 2001
Online since
January 2001
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