Particle Removal Efficiency Evaluation at 40 nm Using Haze Particle Standard |
| Journal |
Solid State Phenomena (Volumes 76 - 77) |
| Volume |
Ultra Clean Processing of Silicon Surfaces V |
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
259-262 |
| DOI |
10.4028/www.scientific.net/SSP.76-77.259 |
| Citation |
Seong Ho Yoo et al., 2001, Solid State Phenomena, 76-77, 259 |
| Authors |
Seong Ho Yoo, Benjamin Y.H. Liu, James Sun, Natraj Narayanswami, Gregory P. Thomes |
| Keywords |
Haze, Wafer Cleaning, Wafer Scanner |
| Full Paper |
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