Dual Gate Oxide for 0.18μm Technologies and Below: Optimization of the Wet Processing Sequence |
| Journal |
Solid State Phenomena (Volumes 76 - 77) |
| Volume |
Ultra Clean Processing of Silicon Surfaces V |
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
27-30 |
| DOI |
10.4028/www.scientific.net/SSP.76-77.27 |
| Citation |
Didier Lévy et al., 2001, Solid State Phenomena, 76-77, 27 |
| Authors |
Didier Lévy, Sébastien Petitdidier, H. Bernard, F. Guyader, C. Dezauzier, C. Pizzetti |
| Keywords |
Dual Gate Oxide, Overetch, Wet Cleaning |
| Full Paper |
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