Dual Gate Oxide for 0.18μm Technologies and Below: Optimization of the Wet Processing Sequence |
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| Journal | Solid State Phenomena (Volumes 76 - 77) |
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| Volume | Ultra Clean Processing of Silicon Surfaces |
| Edited by | Marc Heyns, Marc Meuris and Paul Mertens |
| Pages | 27-30 |
| DOI | 10.4028/www.scientific.net/SSP.76-77.27 |
| Authors | Didier Lévy, Sébastien Petitdidier, H. Bernard, F. Guyader, C. Dezauzier, C. Pizzetti |
| Keywords | Dual Gate Oxide, Overetch, Wet Cleaning |
| Full Paper | 
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