Paper Title:
Dual Gate Oxide for 0.18μm Technologies and Below: Optimization of the Wet Processing Sequence
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 76-77)
Edited by
Marc Heyns, Marc Meuris and Paul Mertens
Pages
27-30
DOI
10.4028/www.scientific.net/SSP.76-77.27
Citation
D. Lévy, S. Petitdidier, H. Bernard, F. Guyader, C. Dezauzier, C. Pizzetti, "Dual Gate Oxide for 0.18μm Technologies and Below: Optimization of the Wet Processing Sequence", Solid State Phenomena, Vols. 76-77, pp. 27-30, 2001
Online since
January 2001
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Price
$32.00
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