Paper Title:
Contamination and Cleaning of Oxide Areas Exposed During Copper CMP in Hydroxylamine Based Slurries
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 76-77)
Edited by
Marc Heyns, Marc Meuris and Paul Mertens
Pages
295-298
DOI
10.4028/www.scientific.net/SSP.76-77.295
Citation
C. Shang, W. Huang, S. Raghavan, Z. F. Chen, R. Small, M. Peterson, J. S. Jeon, "Contamination and Cleaning of Oxide Areas Exposed During Copper CMP in Hydroxylamine Based Slurries", Solid State Phenomena, Vols. 76-77, pp. 295-298, 2001
Online since
January 2001
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Price
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