Post Copper CMP: a Two Steps Cleaning Recipe |
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| Journal | Solid State Phenomena (Volumes 76 - 77) |
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| Volume | Ultra Clean Processing of Silicon Surfaces V |
| Edited by | Marc Heyns, Marc Meuris and Paul Mertens |
| Pages | 299-302 |
| DOI | 10.4028/www.scientific.net/SSP.76-77.299 |
| Citation | Alessio Beverina et al., 2001, Solid State Phenomena, 76-77, 299 |
| Authors | Alessio Beverina, J.M. Fabbri, Didier Lévy, F. Tardif, Pascal Besson |
| Keywords | Cleaning, CMP, Copper (Cu) |
| Full Paper | 
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