Paper Title:
The Effect of DI Water and Intermediate Rinse Solutions on Post Metal Etch Residue Removal Using Semi-Aqueous Cleaning Chemistries
  Abstract

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Periodical
Solid State Phenomena (Volumes 76-77)
Edited by
Marc Heyns, Marc Meuris and Paul Mertens
Pages
307-310
DOI
10.4028/www.scientific.net/SSP.76-77.307
Citation
S. J. Kirk, R. Small, "The Effect of DI Water and Intermediate Rinse Solutions on Post Metal Etch Residue Removal Using Semi-Aqueous Cleaning Chemistries", Solid State Phenomena, Vols. 76-77, pp. 307-310, 2001
Online since
January 2001
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Price
$32.00
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