New Aqueous Clean for Aluminum Interconnects: Part I. Fundamentals |
| Journal |
Solid State Phenomena (Volumes 76 - 77) |
| Volume |
Ultra Clean Processing of Silicon Surfaces |
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
31-34 |
| DOI |
10.4028/www.scientific.net/SSP.76-77.31 |
| Authors |
D.L. Rath,
R. Ravikumar,
D.J. Delehanty,
R.G. Filippi,
E.W. Kiewra,
G. Stojakovic,
K.J. McCullough,
D.D. Miura,
B.N. Rhoads
|
| Keywords |
Aqueous Acid, DRAMs, Galvanic Corrosion, Passivation, Post Al RIE Clean |
| Full Paper |
Get the full paper by clicking here
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