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New Aqueous Clean for Aluminum Interconnects: Part I. Fundamentals

Journal Solid State Phenomena (Volumes 76 - 77)
Volume Ultra Clean Processing of Silicon Surfaces V
Edited by Marc Heyns, Marc Meuris and Paul Mertens
Pages 31-34
DOI 10.4028/www.scientific.net/SSP.76-77.31
Citation D.L. Rath et al., 2001, Solid State Phenomena, 76-77, 31
Authors D.L. Rath, R. Ravikumar, D.J. Delehanty, R.G. Filippi, E.W. Kiewra, G. Stojakovic, K.J. McCullough, D.D. Miura, B.N. Rhoads
Keywords Aqueous Acid, DRAMs, Galvanic Corrosion, Passivation, Post Al RIE Clean
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