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Non-Contact Post Cu CMP Cleaning Using Megasonic Energy

Journal Solid State Phenomena (Volumes 76 - 77)
Volume Ultra Clean Processing of Silicon Surfaces
Edited by Marc Heyns, Marc Meuris and Paul Mertens
Pages 39-42
DOI 10.4028/www.scientific.net/SSP.76-77.39
Authors Wim Fyen, Jeffrey M. Lauerhaas, Ingrid Vos, Marc Meuris, Paul W. Mertens, Marc M. Heyns
Keywords Cu, Megasonics, Post Cu CMP Cleaning
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