Paper Title:
A Hydrogenated Water Application to Semiconductor Manufacturing
| Periodical |
Solid State Phenomena (Volumes 76 - 77)
|
| Main Theme |
Ultra Clean Processing of Silicon Surfaces V
|
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
71-74 |
| DOI |
10.4028/www.scientific.net/SSP.76-77.71 |
| Citation |
Ikunori Yokoi et al., 2001, Solid State Phenomena, 76-77, 71 |
| Authors |
Ikunori Yokoi, Geun Min Choi, Yoshio Yamazaki, Tadahiro Ohmi |
| Keywords |
Copper (Cu), Hydrogenated Ultrapure Water (H2-UPW), Oxidation, Oxidation-Reduction Potential (ORP) |
| Price |
US$ 28,- |