Investigation of Trace Metals Analyses of Dry Residue on Silicon Wafer Surfaces by TXRF and ICP-MS |
| Journal |
Solid State Phenomena (Volumes 76 - 77) |
| Volume |
Ultra Clean Processing of Silicon Surfaces V |
| Edited by |
Marc Heyns, Marc Meuris and Paul Mertens |
| Pages |
75-80 |
| DOI |
10.4028/www.scientific.net/SSP.76-77.75 |
| Citation |
Jiang Bo Wang et al., 2001, Solid State Phenomena, 76-77, 75 |
| Authors |
Jiang Bo Wang, M. Balazs, Piero Pianetta, K. Baur, S. Brennan |
| Keywords |
Dry Residue, ICP-MS, SR-TXRF, TXRF, VPD, Wafer Surface |
| Full Paper |
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