Cathodoluminescence Depth Profiling of Ge-Implanted SiO2 Layers |
| Journal |
Solid State Phenomena (Volumes 78 - 79) |
| Volume |
Beam Injection Assessment of Microstructures in Semiconductors |
| Edited by |
H. Tomokage and T. Sekiguchi |
| Pages |
119-126 |
| DOI |
10.4028/www.scientific.net/SSP.78-79.119 |
| Citation |
Hans Joachim Fitting et al., 2001, Solid State Phenomena, 78-79, 119 |
| Authors |
Hans Joachim Fitting, T. Barfels, Bernd Schmidt, A. von Czarnowski |
| Keywords |
Cathodoluminescence, Depth-Profiling, Luminescent Centers, Thermal Annealing |
| Full Paper |
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