Paper Title:
Surface Concentration Dependence of Diffusion Profile Shape for Phosphorus in Si
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 78-79)
Edited by
H. Tomokage and T. Sekiguchi
Pages
275-280
DOI
10.4028/www.scientific.net/SSP.78-79.275
Citation
Y. Banno, T. Ichino, H. Uchida, M. Ichimura, E. Arai, M. Yoshida, "Surface Concentration Dependence of Diffusion Profile Shape for Phosphorus in Si", Solid State Phenomena, Vols. 78-79, pp. 275-280, 2001
Online since
April 2001
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Price
$35.00
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