Paper Title:
Highly Crystalline Intrinsic Microcrystalline Silicon Films Using SiF4/Ar/H2 Glow Discharge Plasma
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 80-81)
Edited by
O. Bonnaud, T. Mohammed-Brahim, H.P. Strunk and J.H. Werner
Pages
237-242
DOI
10.4028/www.scientific.net/SSP.80-81.237
Citation
S. Kumar, R. Brenot, B. Kalache, V. Tripathi, R. Vanderhaghen, B. Drevillon, P. Roca i Cabarrocas, "Highly Crystalline Intrinsic Microcrystalline Silicon Films Using SiF4/Ar/H2 Glow Discharge Plasma", Solid State Phenomena, Vols. 80-81, pp. 237-242, 2001
Online since
November 2001
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Price
$32.00
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