Paper Title:
Low-Pressure Chemical Vapor Deposition of Semi-Insulating Polycrystalline Silicon (SIPOS) and its Analysis: Application to Power Diode Passivation
  Abstract

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Periodical
Solid State Phenomena (Volumes 80-81)
Edited by
O. Bonnaud, T. Mohammed-Brahim, H.P. Strunk and J.H. Werner
Pages
391-396
DOI
10.4028/www.scientific.net/SSP.80-81.391
Citation
E.S. Ferreira, N.I. Morimoto, "Low-Pressure Chemical Vapor Deposition of Semi-Insulating Polycrystalline Silicon (SIPOS) and its Analysis: Application to Power Diode Passivation", Solid State Phenomena, Vols. 80-81, pp. 391-396, 2001
Online since
November 2001
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Price
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