The Influence of the Use of Different Catalyzers in Hot-Wire CVD for the Deposition of Polycrystalline Silicon Thin Films |
| Journal |
Solid State Phenomena (Volumes 80 - 81) |
| Volume |
Polycrystalline Semiconductors VI |
| Edited by |
O. Bonnaud, T. Mohammed-Brahim, H.P. Strunk and J.H. Werner |
| Pages |
53-58 |
| DOI |
10.4028/www.scientific.net/SSP.80-81.53 |
| Citation |
P.A.T.T. van Veenendaal et al., 2001, Solid State Phenomena, 80-81, 53 |
| Authors |
P.A.T.T. van Veenendaal, Jatindra K. Rath, O.L.J. Gijzeman, Ruud E.I. Schropp |
| Keywords |
Catalysis, Hot-Wire CVD, Polycrystalline Silicon, X-Ray Photoelectron Spectroscopy (XPS) |
| Full Paper |
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