Paper Title:
The Influence of the Use of Different Catalyzers in Hot-Wire CVD for the Deposition of Polycrystalline Silicon Thin Films
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 80-81)
Edited by
O. Bonnaud, T. Mohammed-Brahim, H.P. Strunk and J.H. Werner
Pages
53-58
DOI
10.4028/www.scientific.net/SSP.80-81.53
Citation
P.A.T.T. van Veenendaal, J. K. Rath, O.L.J. Gijzeman, R. E.I. Schropp, "The Influence of the Use of Different Catalyzers in Hot-Wire CVD for the Deposition of Polycrystalline Silicon Thin Films", Solid State Phenomena, Vols. 80-81, pp. 53-58, 2001
Online since
November 2001
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Price
$32.00
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