Paper Title:
Boron-Doped Polysilicon: Growth Kinetics and Structural Study of Low-Pressure Chemical Vapour Deposited Films in the Case of High Doping Levels
  Abstract

  Info
Periodical
Solid State Phenomena (Volumes 80-81)
Edited by
O. Bonnaud, T. Mohammed-Brahim, H.P. Strunk and J.H. Werner
Pages
59-64
DOI
10.4028/www.scientific.net/SSP.80-81.59
Citation
B. Caussat, E. Scheid, B. Legros-de Mauduit, R. Berjoan, "Boron-Doped Polysilicon: Growth Kinetics and Structural Study of Low-Pressure Chemical Vapour Deposited Films in the Case of High Doping Levels", Solid State Phenomena, Vols. 80-81, pp. 59-64, 2001
Online since
November 2001
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Price
$32.00
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