Poly-Crystallized SiGe Thin Films in a Low-Temperature Process |
| Journal |
Solid State Phenomena (Volumes 80 - 81) |
| Volume |
Polycrystalline Semiconductors VI |
| Edited by |
O. Bonnaud, T. Mohammed-Brahim, H.P. Strunk and J.H. Werner |
| Pages |
83-88 |
| DOI |
10.4028/www.scientific.net/SSP.80-81.83 |
| Citation |
Takashi Noguchi, 2001, Solid State Phenomena, 80-81, 83 |
| Authors |
Takashi Noguchi |
| Keywords |
Excimer Laser, Gate, Polycrystalline, Silicon-Germanium (SiGe), SOI, Sputtering, TFT, Vth |
| Full Paper |
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