Poly-Crystallized SiGe Thin Films in a Low-Temperature Process |
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| Journal | Solid State Phenomena (Volumes 80 - 81) |
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| Volume | Polycrystalline Semiconductors VI |
| Edited by | O. Bonnaud, T. Mohammed-Brahim, H.P. Strunk and J.H. Werner |
| Pages | 83-88 |
| DOI | 10.4028/www.scientific.net/SSP.80-81.83 |
| Authors | Takashi Noguchi |
| Keywords | Excimer Laser, Gate, Polycrystalline, Silicon-Germanium (SiGe), SOI, Sputtering, TFT, Vth |
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