Effect of Pressure and Temperature on the Electrical Properties of LPCVD Silicon-Germanium Thin Films |
| Journal |
Solid State Phenomena (Volumes 80 - 81) |
| Volume |
Polycrystalline Semiconductors VI |
| Edited by |
O. Bonnaud, T. Mohammed-Brahim, H.P. Strunk and J.H. Werner |
| Pages |
89-94 |
| DOI |
10.4028/www.scientific.net/SSP.80-81.89 |
| Citation |
Denis Guillet et al., 2001, Solid State Phenomena, 80-81, 89 |
| Authors |
Denis Guillet, M. Sarret, H. Lhermite, O. Bonnaud |
| Keywords |
Amorphous, Electrical Property, Low-Pressure Chemical Vapor Deposition, Silicon-Germanium (SiGe), Solid-Phase Crystallization (SPC) |
| Full Paper |
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